Low Temperature Selective Silicon Epitaxy by Ultra-high Vacuum Rapid Thermal Chemical Vapor Deposition Using Disilane, Hydrogen and Chlorine
| Author | : Katherine Elizabeth Violette |
| Publisher | : |
| Total Pages | : 502 |
| Release | : 1995 |
| ISBN-10 | : OCLC:33840850 |
| ISBN-13 | : |
| Rating | : 4/5 ( Downloads) |
Book Synopsis Low Temperature Selective Silicon Epitaxy by Ultra-high Vacuum Rapid Thermal Chemical Vapor Deposition Using Disilane, Hydrogen and Chlorine by : Katherine Elizabeth Violette
Download or read book Low Temperature Selective Silicon Epitaxy by Ultra-high Vacuum Rapid Thermal Chemical Vapor Deposition Using Disilane, Hydrogen and Chlorine written by Katherine Elizabeth Violette and published by . This book was released on 1995 with total page 502 pages. Available in PDF, EPUB and Kindle. Book excerpt:
