Chemical-Mechanical Polishing - Fundamentals and Challenges: Volume 566

Chemical-Mechanical Polishing - Fundamentals and Challenges: Volume 566
Author :
Publisher :
Total Pages : 304
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ISBN-10 : UCSD:31822028470763
ISBN-13 :
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Book Synopsis Chemical-Mechanical Polishing - Fundamentals and Challenges: Volume 566 by : S. V. Babu

Download or read book Chemical-Mechanical Polishing - Fundamentals and Challenges: Volume 566 written by S. V. Babu and published by . This book was released on 2000-02-10 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.


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"Held May 2000 in Toronto, Canada, as part of the 197th meeting of the Electrochemical Society."--Pref.