Method and Apparatus for Improved High Power Impulse Magnetron Sputtering
Author | : |
Publisher | : |
Total Pages | : |
Release | : 2013 |
ISBN-10 | : OCLC:962172542 |
ISBN-13 | : |
Rating | : 4/5 ( Downloads) |
Download or read book Method and Apparatus for Improved High Power Impulse Magnetron Sputtering written by and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A high power impulse magnetron sputtering apparatus and method using a vacuum chamber with a magnetron target and a substrate positioned in the vacuum chamber. A field coil being positioned between the magnetron target and substrate, and a pulsed power supply and/or a coil bias power supply connected to the field coil. The pulsed power supply connected to the field coil, and the pulsed power supply outputting power pulse widths of greater that 100 .mu.s.