Low Temperature Selective Silicon Epitaxy by Ultra-high Vacuum Rapid Thermal Chemical Vapor Deposition Using Disilane, Hydrogen and Chlorine
Author | : Katherine Elizabeth Violette |
Publisher | : |
Total Pages | : 502 |
Release | : 1995 |
ISBN-10 | : OCLC:33840850 |
ISBN-13 | : |
Rating | : 4/5 ( Downloads) |
Download or read book Low Temperature Selective Silicon Epitaxy by Ultra-high Vacuum Rapid Thermal Chemical Vapor Deposition Using Disilane, Hydrogen and Chlorine written by Katherine Elizabeth Violette and published by . This book was released on 1995 with total page 502 pages. Available in PDF, EPUB and Kindle. Book excerpt: