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Germanosilicide Contacts To Ultra Shallow Pn Junctions Of Nanoscale Cmos Integrated Circuits By Selective Deposition Of In Situ Doped Silicon Germanium Alloys

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Germanosilicide Contacts to Ultra-shallow Pn Junctions of Nanoscale CMOS Integrated Circuits by Selective Deposition of In-situ Doped Silicon-germanium Alloys

Germanosilicide Contacts to Ultra-shallow Pn Junctions of Nanoscale CMOS Integrated Circuits by Selective Deposition of In-situ Doped Silicon-germanium Alloys
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Total Pages : 154
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ISBN-10 : OCLC:52208361
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Book Synopsis Germanosilicide Contacts to Ultra-shallow Pn Junctions of Nanoscale CMOS Integrated Circuits by Selective Deposition of In-situ Doped Silicon-germanium Alloys by : Jing Liu

Download or read book Germanosilicide Contacts to Ultra-shallow Pn Junctions of Nanoscale CMOS Integrated Circuits by Selective Deposition of In-situ Doped Silicon-germanium Alloys written by Jing Liu and published by . This book was released on 2003 with total page 154 pages. Available in PDF, EPUB and Kindle. Book excerpt: Keywords: germanosilicide, silicide, silicon germanium, contact resistance, ultra-shallow junction, source drain, CMOS.


Germanosilicide Contacts to Ultra-shallow Pn Junctions of Nanoscale CMOS Integrated Circuits by Selective Deposition of In-situ Doped Silicon-germanium Alloys Related Books

Germanosilicide Contacts to Ultra-shallow Pn Junctions of Nanoscale CMOS Integrated Circuits by Selective Deposition of In-situ Doped Silicon-germanium Alloys
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Germanosilicide Contacts to Ultra-shallow Pn Junctions of Nanoscale CMOS Integrated Circuits by Selective Deposition of In-situ Doped Silicon-germanium Alloys

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As metal-oxide semiconductor field effect transistors (MOSFETs) are scaled for higher speed and reduced power, new challenges are imposed on the source/drain ju