Atomic Layer Deposition Ald
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Language: en
Pages: 274
Pages: 274
Type: BOOK - Published: 2013-05-28 - Publisher: John Wiley & Sons
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new
Language: en
Pages: 266
Pages: 266
Type: BOOK - Published: 2013-10-18 - Publisher: Springer Science & Business Media
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, log
Language: en
Pages: 463
Pages: 463
Type: BOOK - Published: 2012-09-19 - Publisher: John Wiley & Sons
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays
Language: en
Pages: 366
Pages: 366
Type: BOOK - Published: 2017-03-15 - Publisher: John Wiley & Sons
Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials prepar
Language: en
Pages: 1420
Pages: 1420
Type: BOOK - Published: 2014-11-04 - Publisher: Elsevier
Vol 2A: Basic TechnologiesHandbook of Crystal Growth, Second Edition Volume IIA (Basic Technologies) presents basic growth technologies and modern crystal cutti